Monday, January 21, 2019

The First Atomic Layer Deposition Process for FexN Films

Chem. Commun., 2019, Accepted Manuscript
DOI: 10.1039/C8CC10175B, Communication
Liyong Du, Wei Huang, Yuxiang Zhang, Xinfang Liu, Yuqiang Ding
An efficient process for ALD FexN films was reported in this study for the first time. Bis(N,N'-di-tert-butylacetamidinato)iron-(II) (Fe(tBu-amd)2) and anhydrous hydrazine (N2H4) were used as reactants. Ideal self-limiting growth behavior...
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