Tuesday, February 12, 2019

[ASAP] Self-Catalyzed, Low-Temperature Atomic Layer Deposition of Ruthenium Metal Using Zero-Valent Ru(DMBD)(CO)3 and Water

TOC Graphic

Chemistry of Materials
DOI: 10.1021/acs.chemmater.8b04456
cmatex?d=yIl2AUoC8zA


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