Monday, February 25, 2019

[ASAP] Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru

TOC Graphic

Chemistry of Materials
DOI: 10.1021/acs.chemmater.8b04926
cmatex?d=yIl2AUoC8zA


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